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0.4 MPA Pressure Deionized Water Heater System Inline Fluid Heater For Semiconductor

0.4 MPA Pressure Deionized Water Heater System Inline Fluid Heater For Semiconductor

Product Details:
Place of Origin: China
Brand Name: Surplus
Certification: ISO9001
Model Number: Deionized (DI) Water Heater System 02
Detail Information
Place of Origin:
China
Brand Name:
Surplus
Certification:
ISO9001
Model Number:
Deionized (DI) Water Heater System 02
Supply Voltage (V/Phase)::
110-120 Volt, 200-240 Volt, And 380-480 Volt.
Power(KW):
1,000 Watts (1kW) To 6,000 Watts (6kW).
Dimension:
According Customer's Requirement
Type Of Temperature Control:
PT100 Or J Type
Application:
Process Heating, Power, Chemical, Oil And Gas, Pharmaceuticals, Metals Processing To The Food & Beverage Industry
Material:
SUS316/SUS304 Inside,outsize Quartz Sheath
Cable Length:
2 Meters/3meters/others
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0.4 MPA Deionized Water Heater

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Semiconductor Deionized Water Heater

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0.4 MPA Inline Fluid Heater

Trading Information
Minimum Order Quantity:
1 PCS
Price:
Contact Us
Packaging Details:
Wooden Case or Carton Box
Delivery Time:
10-15 working days
Payment Terms:
TT, Paypal, Western Union
Supply Ability:
50 PC/Month
Product Description
Inline Fluid Heater 0.4 MPA Pressure Deionized Water Heater System
Inline Fluid Heater 0.4 MPA Pressure DI Water Heaters
0.4 MPA Pressure Deionized Water Heater System Inline Fluid Heater For Semiconductor 0

DI Fluid Water Heaters for Semiconductor Manufacturing Process

Model PWH-24i PWH-48i PWH-72i PWH-96i PWH-144i
Heating method Radiation heating with near infrared rays
Heater wattage 24kW 48kW 72kW 96kW 144kW
Standard flow rate (at 55°C) 6l/min 12l/min 18l/min 24l/min 36l/min
Minimum heating flow rate 2l/min 5l/min 10l/min
Temperature setting range 25 to 85°C
Temperature control accuracy ±1°C ※1
Flow meter indication range 0 to 10l/min 0 to 50l/min (Not the guaranteed range of temperature control accuracy)
Allowable DI-Water pressure 0.4MPa (Relief pressure: 0.35MPa)
Heater Halogen lamp. Indirect heating without direct contact with water
Heating vessels material High-purity transparent quartz
Wetted materials of the piping Fluorocarbon polymer
Safety functions Flow rate error, overheating, no liquid operation, leakage sensor disconnection and lamp disconnection Power off, alarm, error indication or signal output in case of error detection
External communication function RS-232C/RS-485 (option) ※2
External input/output function 8-input/14-output signal (Varies depending on specification)
Overall dimensions (mm) ※3 W340×D850×H1384 W340×D850×H1384 W340×D850×H1584 W340×D850×H1986 W1050×D700×H2004
Weight Approx. 140kg Approx. 150kg Approx. 160kg Approx. 210kg Approx. 410kg
Power requirement (50/60Hz) AC200/208V 69/67A AC200/208V 139/133A AC200/208V 208/200A AC200/208V 277/266A AC200/208V 416/400A

A hot water supply system for ultra-pure water that is ideally suited for point-of-use for rinsing of silicon wafers and glass substrates of liquid crystal displays.

DI-Water Heater heats purified water used to rinse silicon wafers in the manufacture of semiconductor and glass substrates in the manufacture of LCDs. The halogen lamps are housed in transparent, double-walled high-purity quartz glass tubes to ensure efficient and contaminant free heating of ultra-pure water. The slim, compact design minimizes foot point for installation at the point of use.

Features
  • Clean - Heating vessels through which water-flows and all plumbing pipes are respectively made of high-purity quartz glass and fluorocarbon polymer.
  • Compact - Slim and compact unit requires minimal foot print for installation at the point of use.
  • Excellent temperature control - High power of halogen lamps quickly raise the temperature and adjust it in response to variations in the water flow rate.
  • High Efficiency - Efficiency with than 95%.
  • Safety - Optimum operational safety is provided through displays and sound alarms against abnormal conditions such as overheating, uncharged heating, excessive pressure and leakage of water.
Applications
  • Heating of ultra-pure water for rinsing of silicon wafers and glass substrates of LCDs.
  • Heating of pure water used in place of CFC for cleaning.
※1 Not the guaranteed range of temperature control accuracy
※2 Option
※3 Dimensions may vary depending on specification