Product Overview
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Overview
This small welded PTFE etching tank is specially designed and manufactured for high-purity semiconductor wet process and wafer etching applications. The inner tank is made of 12mm thick pure PTFE sheet, fully welded with advanced seamless welding technology to ensure excellent structural integrity, zero liquid penetration and long service life under continuous chemical working conditions.
PTFE material features extreme chemical inertness, strong acid and alkali resistance, ultra-low metal ion precipitation, and stable high temperature resistance. It perfectly adapts to various corrosive etching solutions used in semiconductor wafer etching, cleaning and stripping processes, effectively avoiding liquid contamination and protecting wafer surface quality and production yield.
Equipped with a white PP outer protective tank, the double-layer structure greatly improves overall safety and stability. The outer PP tank provides mechanical protection, anti-collision support and secondary leakage prevention, effectively protecting the inner PTFE welding tank from external impact, dust and workshop environment damage. The clean white PP appearance meets high-standard clean room aesthetic and management requirements for semiconductor factories.
Compact small-tank design is ideal for laboratory testing, small-batch wafer production, process trial runs and customized wet bench equipment. The integral welded PTFE structure has no dead corners, no scaling accumulation, easy cleaning and maintenance, fully compliant with high-purity semiconductor manufacturing standards.
Customizable sizes, liquid ports, mounting holes and matching sensor positions are available to fit heaters, temperature sensors and fluid circulation systems. Strict pressure and leakage testing are conducted before delivery to ensure stable, safe and reliable operation in long-term 24-hour semiconductor wet processing work.
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