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Ultrapure Inline Chemical Heater PFA Fluid Heater for Deionized Water in Semiconductor Processes

Ultrapure Inline Chemical Heater PFA Fluid Heater for Deionized Water in Semiconductor Processes

Product Details:
Place of Origin: China
Brand Name: Surplus
Certification: ISO9001,CE
Model Number: IH 045
Detail Information
Place of Origin:
China
Brand Name:
Surplus
Certification:
ISO9001,CE
Model Number:
IH 045
Name:
Ultrapure Inline PFA Fluid Heaters For Heating Deionized Water In High-Purity Processes Of Semiconductor
Voltage:
220V(Customizable)Single Phase/400V 3 Phase
Power:
3KW/4kw/6kw
Material:
PFA
Heater Applications:
Fluid Heating,Semiconductor,Photovoltaic,Surface Finishing,Electro-Plating
Market:
Semiconductor,Life Sciences,Food & Beverage,Industrial
Highlight:

High Light

Highlight:

Ultrapure Inline Chemical Heater

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Deionized Water PFA Fluid Heater

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Semiconductor Inline PFA Heater

Trading Information
Minimum Order Quantity:
1 PCS
Price:
Negotiable
Packaging Details:
Wooden Case or Carton Box
Delivery Time:
10-15 working days
Payment Terms:
T/T
Supply Ability:
50 PC/Month
Product Description

Ultrapure Inline PFA Fluid Heaters For Heating Deionized Water In High-Purity Processes Of Semiconductor

Ultrapure Inline Chemical Heater PFA Fluid Heater for Deionized Water in Semiconductor Processes

 

 

This ultrapure inline PFA fluid heater is purpose-built for heating deionized water within high-purity semiconductor wet processing workflows. Constructed from virgin high-grade PFA fluoropolymer, it delivers exceptional chemical inertness, ultra-low particle release and minimal metal ion leaching, fully compatible with the strict cleanliness requirements of semiconductor manufacturing.

 

Different from conventional immersion heating devices, this inline design allows deionized water to flow directly through the sealed heating channel. It eliminates dead zones and stagnant liquid areas that easily breed contaminants. The smooth seamless PFA inner surface prevents scaling and residue accumulation, maintaining stable water purity throughout continuous operation.

 

It supports precise temperature control to match the heating parameters of DI water cleaning, etching and rinsing stations. The integrated heating core features fast thermal response and uniform heat transfer, avoiding local overheating that may degrade fluid quality or damage process media. The whole assembly can be fitted with temperature sensors, safety interlocks and leak detection modules to meet SEMI S2 and S3 safety standards for semiconductor equipment.

Compact pipeline structure makes it simple to integrate directly into existing fluid piping loops without extra large tank modification. It works reliably under continuous 24-hour running conditions, resisting most clean chemistries alongside deionized water.

 

We provide fully customized sizing, power ratings, connection flange styles and sensor configurations according to your process layout. Every unit goes through strict purity and pressure testing before delivery.

 

Rely on this PFA inline heater to keep your DI water heating consistent, clean and stable for your high-end semiconductor wet process line.

 

 

Ultrapure Inline Chemical Heater PFA Fluid Heater for Deionized Water in Semiconductor Processes

 

 

Ultrapure Inline Chemical Heater PFA Fluid Heater for Deionized Water in Semiconductor Processes

 

Benefits

  • Heavy gauge pre-formed Inconel element can stand up to high stress conditions without breaking down
  • Power modulator monitors heater element temp and prevents heat buildup inside the housing
  • Sealed housing prevents chemistry from attacking internal components & provides secondary containment
  • Internal leak detect strip (requires external monitor) gives early detection of chemical leaks
  • All wiring shielded with teflon conduit to prevent chemical attack
  • Indirect heating design, no submerged heater elements
  • No N2 or gas purge required

Features

  • No O-Ring seals
  • All wetted surfaces are high purity PFA
  • PTFE housing for double containment
  • Maximized watt density for performance
  • Light weight construction
  • Small foot print enabled by unique design
  • Zero maintenance required
  • PFA fluid path, wide chemistry compatibility
  • High temperature capability 200°C+

 

Specifications

Heater
 PFA In-line Chemical Heater
Wattages
1.5-12 kW
Process Chemistries
Dilute Hydrofluoric acids (DHF),
Buffered Hydrofluoric acids (BHF),
Buffered Oxide etch (BOE),
Alkaline Chemicals (TMAH, KOH, NAOH),
Fluorinated Solvents,
Hydrofluoric Acid,
Glycol, and much more.
Max Operating Temperature
180°C (consult factory
for higher temperatures)
Max Pressure
40 psi at 180°C
Voltages
200-400VAC,
single or 3 phase
model dependent

 

Typical Operation & Application In Semiconductor Fabs

 

This ultrapure inline PFA fluid heater is widely deployed on wet benches for wafer fabrication, mainly for heating deionized (DI) / ultra-pure (UPW) water in point-of-use recirculation pipelines.

 

1. Wafer wet cleaning & megasonic rinsing
It heats DI water for SC1, SC2 cleaning sequences and post-etch rinsing. Stable, contamination-free warm DI water removes particles, organic residues and metallic contaminants from wafer surfaces. The inline structure avoids dead volume and secondary pollution, which is critical for advanced node wafer cleaning.

 

2. Post-develop and post-strip rinsing for photolithography
Used for heating rinse water after photoresist developing and photoresist stripping. Consistent temperature helps uniform residue removal and reduces watermarks on patterned wafers.

 

3. Etch process post-rinse station
After oxide, nitride or poly silicon wet etching, heated DI water is delivered to rinse away residual etching chemistries. Precise temperature control prevents uncontrolled side etching and surface damage to delicate thin films.

 

4. Recirculation loop for high-purity fluid supply cabinet
Installed inside chemical delivery cabinets and UPW circulation loops. It maintains set temperature continuously before the fluid reaches the process chamber, supporting 24/7 non-stop fab operation.

 

5. Special substrate & compound semiconductor processing
Suitable for silicon carbide, gallium nitride and other compound wafer cleaning lines. Low metal ion extraction avoids introducing contamination that impacts device yield.

Working conditions: Usually runs from room temperature up to 85–90°C. Wetted surfaces are all virgin PFA, meeting SEMI S2/S3 purity and safety requirements. It can be fitted with temperature transmitters, leak detection and over-temperature interlock protection for automatic wet process equipment.